Ultra-thin corrugated metamaterial film as large-area transmission dynode

Large-area transmission dynodes were fabricated by depositing an ultra-thin continuous film on a silicon wafer with 3-dimensional pattern. After removing the silicon, corrugated membrane enhanced mechanical properties was formed. Mechanical materials, such as this membrane, are engineered to improve its strength and robustness, which allows it span larger surface in comparison flat membranes while thickness remains constant. The consists of three layers (Al$_2$O$_3$ /TiN/Al$_2$O$_3$) is deposited atomic layer deposition (ALD). encapsulated TiN provides in-plane conductivity, needed sustain secondary electron emission. Two types fabricated: hexagonal honeycomb octagonal latter designed match square pitch CMOS pixel chip. yield determined collector-based method using scanning microscope. highest measured A 2.15 achieved for 3.15 keV incident electrons Al$_2$O$_3$ /TiN/Al$_2$O$_3$ tri-layer thicknesses 10/5/15 nm. variation across constructing map. active emission near 100%, i.e. primary generates regardless point impact membrane.